Atomic layer deposited Mo2N thin films using Mo(CO)6 and NH3 plasma as a Cu diffusion barrier

标题
Atomic layer deposited Mo2N thin films using Mo(CO)6 and NH3 plasma as a Cu diffusion barrier
作者
关键词
Mo, 2, N thin films, Mo(CO), 6, Plasma power, Resistivity, Diffusion barrier
出版物
JOURNAL OF ALLOYS AND COMPOUNDS
Volume 858, Issue -, Pages 158314
出版商
Elsevier BV
发表日期
2020-12-17
DOI
10.1016/j.jallcom.2020.158314

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