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High-quality high-throughput silicon laser milling using a 1 kW sub-picosecond laser

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OPTICS LETTERS
卷 46, 期 2, 页码 384-387

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OPTICAL SOC AMER
DOI: 10.1364/OL.411412

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  1. [687880]

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The study reported on high-quality, high-throughput laser milling of silicon with a sub-ps laser delivering over 1 kW of average power. By adjusting the processing strategy and parameters, smooth surfaces with low roughness were achieved while maintaining a high material removal rate.
We report on high-quality high-throughput laser milling of silicon with a sub-ps laser delivering more than 1 kW of average laser power on the workpiece. In order to avoid heat accumulation effects, the processing strategy for high-quality laser milling was adapted to the available average power by using five-pulse bursts, a large beam diameter of 372 mu m to limit the peak fluence per pulse to approximately 0.7 J/cm(2), and a high feed rate of 24 m/s. As a result, smooth surfaces with a low roughness of S-a <= 0.6 mu m were achieved up to the investigated milling depth of 313 mu m while maintaining a high material removal rate of 230 mm(3)/min. (C) 2021 Optical Society of America

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