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Couplings of Polarization with Interfacial Deep Trap and Schottky Interface Controlled Ferroelectric Memristive Switching

期刊

ADVANCED FUNCTIONAL MATERIALS
卷 30, 期 43, 页码 -

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adfm.202000664

关键词

ferroelectrics; memristive switching; metal; oxide interfaces; oxide thin films; semiconductors

资金

  1. NNSA's Laboratory Directed Research and Development Program
  2. U.S. Department of Energy's NNSA [89233218CNA000001]
  3. U.S. National Science Foundation [DMR-1565822, ECCS-1902644, ECCS-1902623]
  4. EPRSC [EP/T012218/1]
  5. UK Royal Academy of Engineering [CiET1819_24]
  6. U.S. Department of Energy, Office of Science, Basic Energy Sciences [DE-SC-0012375]
  7. National Science Foundation [DMR-1708615]
  8. CINT users program
  9. EPSRC [EP/T012218/1] Funding Source: UKRI

向作者/读者索取更多资源

Memristors with excellent scalability have the potential to revolutionize not only the field of information storage but also neuromorphic computing. Conventional metal oxides are widely used as resistive switching materials in memristors. Interface-type memristors based on ferroelectric materials are emerging as alternatives in the development of high-performance memory devices. A clear understanding of the switching mechanisms in this type of memristors, however, is still in its early stages. By comparing the bipolar switching in different systems, it is found that the switchable diode effect in ferroelectric memristors is controlled by polarization modulated Schottky barrier height and polarization coupled interfacial deep states trapping/detrapping. Using semiconductor theories with consideration of polarization effects, a phenomenological theory is developed to explain the current-voltage behavior at the metal/ferroelectric interface. These findings reveal the critical role of the interaction among polarization charges, interfacial defects, and Schottky interface in controlling ferroelectric resistive switching and offer the guidance to design ferroelectric memristors with enhanced performance.

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