Reliability improvements of thin film platinum resistors on wafer-level and micro-hotplates at stress temperatures in the range of 140–290 °C

标题
Reliability improvements of thin film platinum resistors on wafer-level and micro-hotplates at stress temperatures in the range of 140–290 °C
作者
关键词
-
出版物
MICROELECTRONICS RELIABILITY
Volume 104, Issue -, Pages 113557
出版商
Elsevier BV
发表日期
2019-12-13
DOI
10.1016/j.microrel.2019.113557

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