4.6 Article

Stability and Reliability of Lateral GaN Power Field-Effect Transistors

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IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 66, 期 11, 页码 4578-4590

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IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2019.2931718

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Gallium nitride; HEMTs; Aluminum gallium nitride; Wide band gap semiconductors; Logic gates; Integrated circuit reliability; AlGaN; GaN; power transistors; reliability; stability

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GaN electronics constitutes a revolutionary technology with power handling capabilities that amply exceed those of Si and other semiconductors in many applications. RF, microwave, and millimeter-wave GaN-based power amplifiers are now deployed in commercial communications, radar, and sensing systems. GaN power transistors for electrical power management are also starting to reach the marketplace. From the dawn of this technology, inadequate transistor stability and reliability have represented stumbling blocks preventing widespread commercial use of GaN electronics. Intense research has been devoted to addressing these issues, and great progress has taken place recently. This article reviews some of the most interesting and significant stability and reliability issues that have plagued GaN power field-effect transistors for RF and power management applications.

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