Theoretical study of subwavelength circular grating fabrication based on continuously exposed surface plasmon interference lithography

出版年份 2019 全文链接

标题

作者

关键词

Nanolithography, Subwavelength circular grating, Surface plasmon

出版物

Volume 14, Issue -, Pages 102446

出版商

Elsevier BV

发表日期

2019-06-15

DOI

10.1016/j.rinp.2019.102446

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