Universal perpendicular orientation of block copolymer microdomains using a filtered plasma
出版年份 2019 全文链接
标题
Universal perpendicular orientation of block copolymer microdomains using a filtered plasma
作者
关键词
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出版物
Nature Communications
Volume 10, Issue 1, Pages -
出版商
Springer Science and Business Media LLC
发表日期
2019-07-02
DOI
10.1038/s41467-019-10907-5
参考文献
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注意:仅列出部分参考文献,下载原文获取全部文献信息。- Orienting Silicon-Containing Block Copolymer Films with Perpendicular Cylinders via Entropy and Surface Plasma Treatment
- (2017) Kai-Yuan Lu et al. MACROMOLECULES
- Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat
- (2017) Hyo Seon Suh et al. Nature Nanotechnology
- A Top Coat with Solvent Annealing Enables Perpendicular Orientation of Sub-10 nm Microdomains in Si-Containing Block Copolymer Thin Films
- (2014) Eunjin Kim et al. ADVANCED FUNCTIONAL MATERIALS
- Ultra-low-damage radical treatment for the highly controllable oxidation of large-scale graphene sheets
- (2014) Chi-Hsien Huang et al. CARBON
- Interfacial Design for Block Copolymer Thin Films
- (2014) Michael J. Maher et al. CHEMISTRY OF MATERIALS
- Membranes with Highly Ordered Straight Nanopores by Selective Swelling of Fast Perpendicularly Aligned Block Copolymers
- (2013) Jun Yin et al. ACS Nano
- High Polarization and Low-Repulsion ${\rm HfO}_{2}$ Thin Film for Alkali Metal Ion Detections by Plasma System With a Complementary Filter
- (2013) Chi-Hsien Huang et al. IEEE SENSORS JOURNAL
- Topcoat Approaches for Directed Self-Assembly of Strongly Segregating Block Copolymer Thin Films
- (2013) Hiroshi Yoshida et al. JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
- Block Copolymer Lithography
- (2013) Christopher M. Bates et al. MACROMOLECULES
- Polarity-Switching Top Coats Enable Orientation of Sub-10-nm Block Copolymer Domains
- (2012) C. M. Bates et al. SCIENCE
- High-Aspect-Ratio Perpendicular Orientation of PS-b-PDMS Thin Films under Solvent Annealing
- (2012) Jeong Gon Son et al. ACS Macro Letters
- Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats
- (2011) Chi-Chun Liu et al. MACROMOLECULES
- Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films
- (2010) R. L. Bruce et al. JOURNAL OF APPLIED PHYSICS
- Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
- (2009) Joona Bang et al. ADVANCED MATERIALS
- Mechanism for low-etching resistance and surface roughness of ArF photoresist during plasma irradiation
- (2009) Butsurin Jinnai et al. JOURNAL OF APPLIED PHYSICS
- Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma
- (2009) R. L. Bruce et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
- Surfactant-Assisted Orientation of Thin Diblock Copolymer Films
- (2008) Jeong Gon Son et al. ADVANCED MATERIALS
- Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193nm photoresist roughening and degradation
- (2008) D. Nest et al. APPLIED PHYSICS LETTERS
- Effect of Composition of Substrate-Modifying Random Copolymers on the Orientation of Symmetric and Asymmetric Diblock Copolymer Domains
- (2008) Eungnak Han et al. MACROMOLECULES
- Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films
- (2008) Shengxiang Ji et al. MACROMOLECULES
- Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly
- (2008) R. Ruiz et al. SCIENCE
- Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates
- (2008) I. Bita et al. SCIENCE
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