Tuning high power impulse magnetron sputtering discharge and substrate bias conditions to reduce the intrinsic stress of TiN thin films

出版年份 2019 全文链接

标题

作者

关键词

High power impulse magnetron sputtering, Substrate bias synchronization, Intrinsic stress, Titanium nitride, Thin films

出版物

Volume -, Issue -, Pages -

出版商

Elsevier BV

发表日期

2019-05-31

DOI

10.1016/j.tsf.2019.05.054

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