Effects of post-lithography cleaning on the yield and performance of CVD graphene-based devices

标题
Effects of post-lithography cleaning on the yield and performance of CVD graphene-based devices
作者
关键词
-
出版物
Beilstein Journal of Nanotechnology
Volume 10, Issue -, Pages 349-355
出版商
Beilstein Institut
发表日期
2019-02-05
DOI
10.3762/bjnano.10.34

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