A two-step growth route of ternary aluminium doped zirconium oxide film on silicon

出版年份 2018 全文链接

标题

作者

关键词

Co-sputtering, Growth, Al, x, Zr, y, O, z, Oxygen interstitials, Vacancies, Metal-oxide-semiconductor

出版物

JOURNAL OF ALLOYS AND COMPOUNDS

Volume 777, Issue -, Pages 736-748

出版商

Elsevier BV

发表日期

2018-11-04

DOI

10.1016/j.jallcom.2018.10.359

向作者/读者发起求助以获取更多资源

Protocol

在线求助

Reagent

在线求助

Reprint

联系作者

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More