Solution-processed high-k HfO2 gate dielectric processed under softening temperature of polymer substrates

标题
Solution-processed high-k HfO2 gate dielectric processed under softening temperature of polymer substrates
作者
关键词
-
出版物
Journal of Materials Chemistry C
Volume 1, Issue 8, Pages 1651
出版商
Royal Society of Chemistry (RSC)
发表日期
2012-12-13
DOI
10.1039/c2tc00481j

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