标题
Plasma-enhanced chemical vapor deposition of graphene on copper substrates
作者
关键词
-
出版物
AIP Advances
Volume 4, Issue 4, Pages 047128
出版商
AIP Publishing
发表日期
2014-04-23
DOI
10.1063/1.4873157
参考文献
相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。- Extreme Monolayer-Selectivity of Hydrogen-Plasma Reactions with Graphene
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