Amorphous boron–indium–zinc-oxide active channel layers for thin-film transistor fabrication
出版年份 2015 全文链接
标题
Amorphous boron–indium–zinc-oxide active channel layers for thin-film transistor fabrication
作者
关键词
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出版物
Journal of Materials Chemistry C
Volume 3, Issue 8, Pages 1661-1665
出版商
Royal Society of Chemistry (RSC)
发表日期
2014-12-08
DOI
10.1039/c4tc01831a
参考文献
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