期刊
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
卷 5, 期 2, 页码 P124-P127出版社
ELECTROCHEMICAL SOC INC
DOI: 10.1149/2.0371602jss
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资金
- American Society for Engineering Education
- National Research Council
- Office of Naval Research
Selective p-type doping of Si-doped GaN by Mg ion implantation and multicycle rapid thermal annealing (MRTA) is demonstrated. Samples of GaN were capped by AlN and annealed in N-2 overpressure at temperatures up to 1330 degrees C. MRTA resulted in a lower resistivity films, compared to a conventionally-annealed reference sample. Mg acceptor activation for the MRTA annealed sample was calculated using a two-layer corrected Hall method to be about 1% at room temperature. Low temperature photoluminescence revealed donor-acceptor bound electron-hole pair recombination near 3.2 eV, indicating activation of Mg upon MRTA annealing. (C) 2015 The Electrochemical Society. All rights reserved.
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