Low temperature deposition of SiOx insulator film with newly developed facing electrodes chemical vapor deposition

标题
Low temperature deposition of SiOx insulator film with newly developed facing electrodes chemical vapor deposition
作者
关键词
-
出版物
VACUUM
Volume 101, Issue -, Pages 189-192
出版商
Elsevier BV
发表日期
2013-09-02
DOI
10.1016/j.vacuum.2013.08.003

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