期刊
VACUUM
卷 87, 期 -, 页码 218-221出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2012.05.029
关键词
Rf sputtering; Thin film; PTFE; Fluorocarbon; Adhesion strength
Fluorocarbon thin films were formed by radio-frequency magnetron sputtering using a polytetrafluoroethylene target with different substrate temperatures in the range -5 to 200 degrees C. Using X-ray diffraction and Fourier transform infrared spectroscopy, it was confirmed that the films were amorphous and contained C-F bonds. X-ray photoelectron spectroscopy measurements indicated that the amount of cross-linking in the films increased with increasing substrate temperature. Corresponding to the change in the molecular structure, the adhesion strength of the films to the Si substrate, estimated by micro-scratch testing, improved with increasing substrate temperature. (C) 2012 Elsevier Ltd. All rights reserved.
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