Radio frequency-H 2 O plasma treatment on indium tin oxide films produced by electron beam and radio frequency magnetron sputtering methods

出版年份 2014 全文链接

标题

作者

关键词

出版物

Volume 567, Issue -, Pages 32-37

出版商

Elsevier BV

发表日期

2014-07-28

DOI

10.1016/j.tsf.2014.07.035

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