Effect of an ultrathin SiO2 interfacial layer on the hysteretic current–voltage characteristics of CeOx-based metal–insulator–metal structures

标题
Effect of an ultrathin SiO2 interfacial layer on the hysteretic current–voltage characteristics of CeOx-based metal–insulator–metal structures
作者
关键词
-
出版物
THIN SOLID FILMS
Volume 533, Issue -, Pages 38-42
出版商
Elsevier BV
发表日期
2012-11-10
DOI
10.1016/j.tsf.2012.10.105

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