Pulsed-radio frequency plasma enhanced chemical vapour deposition of low temperature silicon nitride for thin film transistors

出版年份 2012 全文链接

标题

Pulsed-radio frequency plasma enhanced chemical vapour deposition of low temperature silicon nitride for thin film transistors

作者

关键词

-

出版物

THIN SOLID FILMS

Volume 520, Issue 15, Pages 4831-4834

出版商

Elsevier BV

发表日期

2012-03-14

DOI

10.1016/j.tsf.2012.03.010

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