4.4 Article

Photoinduced hydrophobic surface of graphene oxide thin films

期刊

THIN SOLID FILMS
卷 520, 期 9, 页码 3539-3543

出版社

ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2012.01.003

关键词

Graphene oxide; Wettability; Hydrophobic surface; UV irradiation

资金

  1. National Basic Research Program of China [2012CB934300, 2011CB933302]
  2. Shanghai Science and Technology Commission [1052nm01800]
  3. Key Disciplines Innovative Personnel Training Plan of Fudan University

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Graphene oxide (GO) thin films were deposited on transparent conducting oxide substrates and glass slides by spin coating method at room temperature. The wettability of GO thin films before and after ultraviolet (UV) irradiation was characterized with water contact angles, which increased from 27.3 degrees to 57.6 degrees after 3 h of irradiation, indicating a photo-induced hydrophobic surface. The UV-vis absorption spectra, Raman spectroscopy, X-ray photoelectron spectroscopy, and conductivity measurements of GO films before and after UV irradiation were taken to study the mechanism of photoinduced hydrophobic surface of GO thin films. It is demonstrated that the photoinduced hydrophobic surface is ascribed to the elimination of oxygen-containing functional groups on GO molecules. This work provides a simple strategy to control the wettability properties of GO thin films by UV irradiation. (C) 2012 Elsevier B.V. All rights reserved.

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