High resolution Rutherford Backscattering Spectrometry investigations of ZrO2 layer growth in the initial stage on native silicon oxide and titanium nitride

标题
High resolution Rutherford Backscattering Spectrometry investigations of ZrO2 layer growth in the initial stage on native silicon oxide and titanium nitride
作者
关键词
-
出版物
THIN SOLID FILMS
Volume 520, Issue 18, Pages 5900-5905
出版商
Elsevier BV
发表日期
2012-05-11
DOI
10.1016/j.tsf.2012.04.086

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