期刊
THIN SOLID FILMS
卷 520, 期 7, 页码 2575-2581出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2011.11.003
关键词
Carbon nanofibers; Gas ratio; Nickel; Catalyst thickness; Plasma-enhanced chemical vapor deposition; Raman spectroscopy; Scanning election microscopy
类别
资金
- Universiti Teknologi Malaysia
- Ministry of Science, Technology and Innovation Malaysia
The characteristics of carbon nanofibers (CNFs) grown, using direct current plasma enhanced chemical vapor deposition system reactor under various acetylene to ammonia gas ratios and different catalyst thicknesses were studied. Nickel/Chromium-glass (Ni/Cr-glass) thin film catalyst was employed for the growth of CNF. The grown CNFs were then characterized using Raman spectroscopy, field emission scanning electron microscopy and transmission electron microscopy (TEM). Raman spectroscopy showed that the Ni/Cr-glass lwith thickness of 15 nm and gas ratio acetylene to ammonia of 1:3 produced CNFs with the lowest I-D/I-G value (the relative intensity of D-band to G-band). This indicated that this catalyst thickness and gas ratio value is the optimum combination for the synthesis of CNFs under the conditions studied. TEM observation pointed out that the CNFs produced have 104 concentric walls and the residual catalyst particles were located inside the tubes of CNFs. It was also observed that structural morphology of the grown CNFs was influenced by acetylene to ammonia gas ratio and catalyst thickness. (C) 2011 Elsevier B.V. All rights reserved.
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