期刊
THIN SOLID FILMS
卷 519, 期 15, 页码 5194-5198出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2011.01.110
关键词
Nanoimprint; Anti-reflection; Sub-wavelength structure
类别
资金
- National Science Council of Republic of China [NSC 96-2112-M-009-024-MY3, NSC 96-2120-M-009-004]
- MOE
Anti-reflection (AR) thin films composed of ordered arrays of tapered nanostructures on the surface of PMMA and silicon, through the hot-embossing nanoimprint of polymer using molds prepared from e-beam lithography and hydrothermally grown ZnO nanorod arrays. The use of PMMA and ZnO nanorod thin films allows the formation of anti-reflection structures on a curved or flat surface to effectively suppress the reflectance of the incident light. It provides a simple and low-cost means for large-scale use in the production of AR layers for improving optical and optoelectronic device performance, such as solar cells and photodetectors. A drastic reduction in the reflectivity of the AR layer over a broad spectral range was demonstrated. In addition, the great improvement on the light harvest efficiency of the solar cells by over 30% using the nanostructured AR layer was validated. (C) 2011 Elsevier B.V. All rights reserved.
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