Atmospheric-pressure argon plasma etching of spin-coated 3,4-polyethylenedioxythiophene:polystyrenesulfonic acid (PEDOT:PSS) films for cupper phtalocyanine (CuPc)/C60 heterojunction thin-film solar cells

标题
Atmospheric-pressure argon plasma etching of spin-coated 3,4-polyethylenedioxythiophene:polystyrenesulfonic acid (PEDOT:PSS) films for cupper phtalocyanine (CuPc)/C60 heterojunction thin-film solar cells
作者
关键词
-
出版物
THIN SOLID FILMS
Volume 519, Issue 20, Pages 6834-6839
出版商
Elsevier BV
发表日期
2011-04-25
DOI
10.1016/j.tsf.2011.04.042

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