Defect passivation by O2 plasma treatment on high-k dielectric HfO2 films at room temperature

标题
Defect passivation by O2 plasma treatment on high-k dielectric HfO2 films at room temperature
作者
关键词
-
出版物
THIN SOLID FILMS
Volume 519, Issue 15, Pages 5110-5113
出版商
Elsevier BV
发表日期
2011-01-27
DOI
10.1016/j.tsf.2011.01.154

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