Atomic layer deposition of HfO2: Growth initiation study on metallic underlayers

标题
Atomic layer deposition of HfO2: Growth initiation study on metallic underlayers
作者
关键词
-
出版物
THIN SOLID FILMS
Volume 518, Issue 15, Pages 4081-4086
出版商
Elsevier BV
发表日期
2009-10-31
DOI
10.1016/j.tsf.2009.10.146

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