In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope

标题
In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope
作者
关键词
-
出版物
THIN SOLID FILMS
Volume 518, Issue 16, Pages 4688-4691
出版商
Elsevier BV
发表日期
2009-12-12
DOI
10.1016/j.tsf.2009.12.060

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