Evolution of SiO2/Ge/HfO2(Ge) multilayer structure during high temperature annealing

标题
Evolution of SiO2/Ge/HfO2(Ge) multilayer structure during high temperature annealing
作者
关键词
-
出版物
THIN SOLID FILMS
Volume 518, Issue 9, Pages 2365-2369
出版商
Elsevier BV
发表日期
2009-10-15
DOI
10.1016/j.tsf.2009.09.156

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