期刊
TECHNICAL PHYSICS LETTERS
卷 39, 期 2, 页码 147-149出版社
MAIK NAUKA/INTERPERIODICA/SPRINGER
DOI: 10.1134/S1063785013020090
关键词
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The formation of wavy microstructures under the action of a nanosecond pulsed high-power ion beam on the surface of single-crystalline silicon covered with intrinsic oxide layers of various thickness has been studied. Morphological features of the observed structures depend on the oxide layer thickness and ion beam current density. Possible mechanisms of formation of these microstructures are considered.
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