TiO2 chemical vapor deposition on Si(111) in ultrahigh vacuum: Transition from interfacial phase to crystalline phase in the reaction limited regime

标题
TiO2 chemical vapor deposition on Si(111) in ultrahigh vacuum: Transition from interfacial phase to crystalline phase in the reaction limited regime
作者
关键词
-
出版物
SURFACE SCIENCE
Volume 605, Issue 13-14, Pages 1147-1156
出版商
Elsevier BV
发表日期
2011-03-11
DOI
10.1016/j.susc.2011.03.001

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