One/two-photon-sensitive photoacid generators based on benzene oligomer-containing D–π–A-type aryl dialkylsulfonium salts
出版年份 2015 全文链接
标题
One/two-photon-sensitive photoacid generators based on benzene oligomer-containing D–π–A-type aryl dialkylsulfonium salts
作者
关键词
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出版物
RSC Advances
Volume 5, Issue 68, Pages 55340-55347
出版商
Royal Society of Chemistry (RSC)
发表日期
2015-06-18
DOI
10.1039/c5ra11350d
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