Nondestructive investigation of interface states in high-k oxide films on Ge substrate using X-ray absorption spectroscopy

出版年份 2012 全文链接

标题

作者

关键词

出版物

Volume 6, Issue 4, Pages 181-183

出版商

Wiley

发表日期

2012-03-12

DOI

10.1002/pssr.201206059

参考文献

查看 5 条相关文献

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now