Si-nanowire-based multistage delayed Mach–Zehnder interferometer optical MUX/DeMUX fabricated by an ArF-immersion lithography process on a 300  mm SOI wafer

标题
Si-nanowire-based multistage delayed Mach–Zehnder interferometer optical MUX/DeMUX fabricated by an ArF-immersion lithography process on a 300  mm SOI wafer
作者
关键词
-
出版物
OPTICS LETTERS
Volume 39, Issue 13, Pages 3702
出版商
The Optical Society
发表日期
2014-06-13
DOI
10.1364/ol.39.003702

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