标题
120 nm resolution and 55 nm structure size in STED-lithography
作者
关键词
-
出版物
OPTICS EXPRESS
Volume 21, Issue 9, Pages 10831
出版商
The Optical Society
发表日期
2013-04-25
DOI
10.1364/oe.21.010831
参考文献
相关参考文献
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