期刊
OPTICAL AND QUANTUM ELECTRONICS
卷 44, 期 12-13, 页码 521-526出版社
SPRINGER
DOI: 10.1007/s11082-012-9563-2
关键词
Fiber-to-chip grating coupler; Deep ultraviolet lithography; Single etch process
资金
- National Research Council of Canada (NRC) Genomics and Health Initiative
- Spanish Ministerio de Ciencia [TEC2009-10152]
- Andalusian Regional Ministry of Science, Innovation and Business [P07-TIC-02946]
- European Mirthe project [FP7-2010-257980]
Surface grating couplers enable efficient coupling of light between optical fibers and planar waveguide circuits. While traditional grating designs require two etch steps for efficient coupling to silicon-on-insulator waveguides, recently proposed subwavelength structured gratings can achieve the same coupling efficiencies with a single etch step, thereby significantly reducing fabrication complexity. Here we demonstrate that such couplers can be fabricated on a large scale with ultra-violet lithography, achieving a 5 dB coupling efficiency at 1,550 nm. Through both simulations and experiments we give physical insight on how pattern fidelity impacts the performance of these couplers, and propose strategies to deal with inevitable process variations.
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