Isotropic wet chemical etching of deep channels with optical surface quality in silicon with HNA based etching solutions

标题
Isotropic wet chemical etching of deep channels with optical surface quality in silicon with HNA based etching solutions
作者
关键词
-
出版物
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Volume 16, Issue 6, Pages 1428-1433
出版商
Elsevier BV
发表日期
2013-07-05
DOI
10.1016/j.mssp.2013.05.017

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