期刊
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
卷 16, 期 5, 页码 1267-1270出版社
ELSEVIER SCI LTD
DOI: 10.1016/j.mssp.2013.01.026
关键词
Thin films; SnO2; Atypical grain; Grain growth
类别
资金
- Chosun Nursing College
SnO2 thin films were grown on Si substrate using the chemical vapor deposition(CVD) method. The surface of the thin film was examined using a transmission electron microscope (TEM) and a scanning electron microscope (SEM). Atypical shaped grains and atypical columnar structures were observed on the SnO2 thin films that were exposed to air after first deposition and during re-deposition in anaerobic conditions in the CVD. The electrical properties of SnO2 thin films feature a lower range of resistance in single mode, but after the atypical particles appear, the electrical resistance decreased. (C) 2013 Elsevier Ltd. All rights reserved.
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