4.6 Article

Growth and characterization of non-polar ZnO thin films by pulsed laser deposition

期刊

MATERIALS LETTERS
卷 64, 期 10, 页码 1190-1192

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ELSEVIER
DOI: 10.1016/j.matlet.2010.02.047

关键词

ZnO; PLD; Thin film; Non-polar; AFM; Coatings

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  1. KIAT under MKE and Busan City

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Non-polar ZnO thin films were fabricated on r-plane sapphire substrates by pulsed laser deposition at various temperatures from 100 to 500 degrees C. The effects of the substrate temperature on structural, morphological and optical properties of the films were investigated. Based on the X-ray diffraction analysis, the ZnO thin films grown at 300, 400 and 500 degrees C exhibited the non-polar (a-plane) orientation and those deposited below 300 degrees C exhibited polar (c-plane) orientation. In the optical properties of non-polar ZnO films, there were two photoluminescence peaks detected. The peaks (near-band edge emission, blue emission) are due to electron transitions from band-to-band and shallow donor level to valence band, respectively. (C) 2010 Elsevier B.V. All rights reserved.

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