Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography

标题
Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography
作者
关键词
-
出版物
MACROMOLECULES
Volume 47, Issue 4, Pages 1411-1418
出版商
American Chemical Society (ACS)
发表日期
2014-02-11
DOI
10.1021/ma4020164

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