Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C[sub 4]F[sub 8]- and CF[sub 4]-based discharges
Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C[sub 4]F[sub 8]- and CF[sub 4]-based discharges
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