Limiting factors in sub-10 nm scanning-electron-beam lithography

标题
Limiting factors in sub-10 nm scanning-electron-beam lithography
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 27, Issue 6, Pages 2616
出版商
American Vacuum Society
发表日期
2009-12-02
DOI
10.1116/1.3253603

向作者/读者发起求助以获取更多资源

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search