Effect of annealing and electrical properties of high-κ thin films grown by atomic layer deposition using carboxylic acids as oxygen source

标题
Effect of annealing and electrical properties of high-κ thin films grown by atomic layer deposition using carboxylic acids as oxygen source
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 27, Issue 1, Pages 230
出版商
American Vacuum Society
发表日期
2009-02-11
DOI
10.1116/1.3058743

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