REBL: A novel approach to high speed maskless electron beam direct write lithography

标题
REBL: A novel approach to high speed maskless electron beam direct write lithography
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 27, Issue 1, Pages 161
出版商
American Vacuum Society
发表日期
2009-02-11
DOI
10.1116/1.3054281

向作者/读者发起求助以获取更多资源

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started