Patterned wafer defect density analysis of step and flash imprint lithography

标题
Patterned wafer defect density analysis of step and flash imprint lithography
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 26, Issue 1, Pages 151
出版商
American Vacuum Society
发表日期
2008-02-16
DOI
10.1116/1.2825164

向作者/读者发起求助以获取更多资源

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search