Impact of plasma treatment on electrical properties of TiO2/RuO2based DRAM capacitor

标题
Impact of plasma treatment on electrical properties of TiO2/RuO2based DRAM capacitor
作者
关键词
-
出版物
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 46, Issue 38, Pages 385304
出版商
IOP Publishing
发表日期
2013-09-04
DOI
10.1088/0022-3727/46/38/385304

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