Optimized molecule supply from nozzle-based gas injection systems for focused electron- and ion-beam induced deposition and etching: simulation and experiment

标题
Optimized molecule supply from nozzle-based gas injection systems for focused electron- and ion-beam induced deposition and etching: simulation and experiment
作者
关键词
-
出版物
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 42, Issue 12, Pages 125305
出版商
IOP Publishing
发表日期
2009-06-05
DOI
10.1088/0022-3727/42/12/125305

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