Mechanism for the Atomic Layer Deposition of Copper Using Diethylzinc as the Reducing Agent: A Density Functional Theory Study Using Gas-Phase Molecules as a Model

标题
Mechanism for the Atomic Layer Deposition of Copper Using Diethylzinc as the Reducing Agent: A Density Functional Theory Study Using Gas-Phase Molecules as a Model
作者
关键词
-
出版物
JOURNAL OF PHYSICAL CHEMISTRY A
Volume 116, Issue 35, Pages 8893-8901
出版商
American Chemical Society (ACS)
发表日期
2012-08-14
DOI
10.1021/jp304460z

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