Selection of post-growth treatment parameters for atomic layer deposition of structurally disordered TiO2 thin films

出版年份 2007 全文链接

标题

Selection of post-growth treatment parameters for atomic layer deposition of structurally disordered TiO2 thin films

作者

关键词

-

出版物

JOURNAL OF NON-CRYSTALLINE SOLIDS

Volume 354, Issue 2-9, Pages 404-408

出版商

Elsevier BV

发表日期

2007-10-26

DOI

10.1016/j.jnoncrysol.2007.07.051

向作者/读者发起求助以获取更多资源

Protocol

Reagent

Reprint

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

© Peeref 2019-2024. All rights reserved.