Incorporation and Activation of Arsenic Dopant in Single-Crystal CdTe Grown on Si by Molecular Beam Epitaxy

标题
Incorporation and Activation of Arsenic Dopant in Single-Crystal CdTe Grown on Si by Molecular Beam Epitaxy
作者
关键词
CdTe, As-doping, incorporation, SIMS, activation, Hall measurement, dislocations
出版物
JOURNAL OF ELECTRONIC MATERIALS
Volume 43, Issue 8, Pages 2998-3003
出版商
Springer Nature
发表日期
2014-05-08
DOI
10.1007/s11664-014-3173-7

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