期刊
JOURNAL OF COLLOID AND INTERFACE SCIENCE
卷 364, 期 1, 页码 219-229出版社
ACADEMIC PRESS INC ELSEVIER SCIENCE
DOI: 10.1016/j.jcis.2011.07.030
关键词
Superhydrophobic; Hierarchical structure; Deep reactive ion etching; Galvanic etching; Two-scale model
资金
- National Natural Science Foundation of China [51005187]
- Natural Science Basic Research Plan in Shaanxi Province of China [2010JM7012]
- NPU Foundation for Fundamental Research [JC200826]
- NPU
An effective fabrication method combining deep reactive ion etching and galvanic etching for silicon micro-nano hierarchical structures is presented in this paper. The method can partially control the morphology of the nanostructures and enables us to investigate the effects of geometry changes on the properties of the surfaces. The forming mechanism of silicon nanostructures based on silver nanoparticle galvanic etching was illustrated and the effects of process parameters on the surface morphology were thoroughly discussed. It is found that process parameters have more impact on the height of silicon nanostructure than its diameter. Contact angle measurement and tilting/dropping test results show that as-prepared silicon surfaces with hierarchical structures were superhydrophobic. What's more, two-scale model composed of micropillar arrays and nanopillar arrays was proposed to study the wettability of the surface with hierarchical structures. Wettability analysis results indicate that the superhydrophobic surface may demonstrate a hybrid state at which water sits on nanoscale pillars and immerses into microscale grooves partially. (C) 2011 Published by Elsevier Inc.
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